Positive quinone diazide photoresist composition containing sele

Details Positive quinone diazide photoresist composition containing sele Positive quinone diazide photoresist composition containing sele

1992-03-25

1994-06-28

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430192, 430512, G03F 7023, G03C 161

Patent

active

053246195

ABSTRACT:
A composition, useful for its excellent resolution, sensitivity, development properties, and heat resistance, having an alkali soluble resin and a quinonediazide compound as essential ingredients, and further containing at least one polyhydroxy compound represented by the following formula (I) or (II): ##STR1## wherein R's, which may be the same or different, each represents a hydrogen atom, a halogen atom, a hydroxyl group, an alkyl group, an alkoxy group or --CH.sub.2 N--(--CH.sub.2 COOH).sub.2 ; X represents a --C(.dbd.O)-- group or an --SO.sub.2 -- group; m is an integer of 1 to 3; and n is an integer of 1 to 4.

REFERENCES:
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patent: 4923781 (1990-05-01), Fujikara et al.
patent: 5008362 (1991-04-01), Wilharm et al.
patent: 5064741 (1991-11-01), Koike et al.
patent: 5173389 (1992-12-01), Uenishi et al.

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