Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent
1977-03-30
1978-12-19
Anderson, Bruce C.
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
250398, H01J 3726
Patent
active
041307615
ABSTRACT:
An electron beam exposure apparatus is provided with a blanking section to which electron beams emitted from an electron gun whose directions are paralleled through condenser lens are projected. The blanking section includes a slit plate with a plurality of perforations equally spaced for dividing the parallel electron beams into a plurality of electron beam bundles, plural sets of deflection electrodes disposed along the path of the advancing bundles of electron beams passing through the perforations of the slit plate in such a way that each bundle of electron beams passes between each set of deflection electrodes, and a mask plate with a plurality of perforations permitting straight advancing of only the bundles of electron beams passed through the perforations of the slit plate. The blanking section selectively blocks or permits the advancing therethrough of the bundles of electron beams. The bundles of electron beams passed through the blanking section are reduced, or compressed by a projection lens and their directions are pralleled thereby. All of the bundles of parallel electron beams passed through the projection lens are deflected by a deflection apparatus and then projected onto a predetermined region of the photoresist of the wafer. As a result, on the predetermined area on the photoresist of the wafer, the bundles of electron beams are scanned slightly, so that a given pattern is exposed.
REFERENCES:
patent: 3491236 (1970-01-01), Newberry
patent: 3619608 (1971-11-01), Westerberg
patent: 3715580 (1973-02-01), Mackawa et al.
patent: 3717785 (1973-02-01), Guernet
patent: 3736425 (1973-05-01), Chernow
patent: 3900737 (1975-08-01), Collier et al.
patent: 3956635 (1976-05-01), Chang
Anderson Bruce C.
Tokyo Shibaura Electric Co. Ltd.
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