Process of producing a semiconductor device

Details Process of producing a semiconductor device Process of producing a semiconductor device

1983-05-31

1985-07-30

Pianalto, Bernard D.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

427 39, 427 88, 427 95, 4272553, C23C 1500

Patent

active

045320225

ABSTRACT:
A silicon nitride film containing from 20 to 70% oxygen, for use as a surface passivation film, has enhanced ultraviolet ray transmissivity while exhibiting the desirable moisture proofness quality of a silicon nitride film.

REFERENCES:
patent: 3629088 (1971-12-01), Frank et al.

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