Semiconductor device having a blocking capability in only one di

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357 20, 357 38, 357 55, 357 56, 357 89, 357 90, H01L 2934

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active

046426698

ABSTRACT:
For improving the dynamic characteristics of semiconductor components required to absorb high reverse voltages only in one polarity (diodes, reverse-conducting thyristors and asymmetric thyristors), in many cases structures having an n base consisting of two layers are used. In order to improve the reverse-voltage capability, it is proposed, in a semiconductor component having at least one pn.sup.- n sequence of layers, to select the thickness (S) and the doping of an n stop layer (4) in such a way that the following applies: ##EQU1## where e=elementary charge, .epsilon.=dielectric constant of the semiconductor, N.sub.D =donor concentration, X=path coordinate, 0.8.ltoreq.k.ltoreq.1.0 and E.sub.n =field strength at the n.sup.- n junction. The effect of this measure is that the geometric conditions of the edge chamfering are less stringent. The edge can also be shaped by means of conventional etching processes.

REFERENCES:
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patent: 3449826 (1969-06-01), Eugster et al.
patent: 3495138 (1970-02-01), Bradley
patent: 3697829 (1972-10-01), Huth et al.
patent: 4214255 (1980-07-01), Neilson
patent: 4255757 (1981-03-01), Hikin
patent: 4517582 (1985-05-01), Sittig

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