Plastic and nonmetallic article shaping or treating: processes – Pore forming in situ
Patent
1981-07-20
1984-11-13
Lawrence, Evan K.
Plastic and nonmetallic article shaping or treating: processes
Pore forming in situ
2642105, 2642888, 2642893, B29D 2704
Patent
active
044825145
ABSTRACT:
A process is disclosed for the production of a membrane suitable for ultrafiltration and cast from a solution in formic acid of a polyamide or a mixture of polyamides, characterized by bringing the solution produced with the addition of about 1 to 7% polyethylene glycol to a temperature below about 18.degree. C., applying the solution as thin layer onto a carrier film resistant to the constituents of the solution, conducting this solution through a precipitating and washing bath moving in the reverse direction, with said layer, subsequent to emerging from the bath, being stripped from the carrier film as a coagulated and washed membrane and dried thereafter. Preferred embodiments include stretching the membrane, prior to drying, to a ratio from 1.5:1 to 2.5:1; subjecting it to heat setting in conjunction with the drying; using a minimum formic acid concentration of 80% for the solution or mixture; using 12 to 22% polyamide in the solution or mixture; and employing an air stretch of 2 seconds, before the precipitating and washing bath.
REFERENCES:
patent: 3615024 (1971-10-01), Michaels
patent: 3876738 (1975-04-01), Marinaccio et al.
patent: 4203847 (1980-05-01), Grandine
patent: 4340481 (1982-07-01), Mishiro et al.
Maier Franz
Schindler Erich
Akzo N.V.
Lawrence Evan K.
Striker Michael J.
LandOfFree
Process for the production of an ultrafiltration membrane from p does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for the production of an ultrafiltration membrane from p, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for the production of an ultrafiltration membrane from p will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2360405