Process for determining photoresist develop time by optical tran

Details Process for determining photoresist develop time by optical tran Process for determining photoresist develop time by optical tran

1987-12-17

1989-07-25

Dees, Jose G.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430311, 430325, 156626, 356442, 356436, 354298, 250573, G03G 524

Patent

active

048513113

ABSTRACT:
A reflective beam of light is used to analyze the optical transmission properties of a developer fluid during puddle develop of photoresist polymer for detercting the process endpoint.

REFERENCES:
patent: 4023193 (1977-05-01), Schroter et al.
patent: 4119989 (1978-10-01), Carvalko et al.
patent: 4136740 (1979-01-01), Lin
patent: 4263089 (1981-04-01), Keller
patent: 4647172 (1987-03-01), Batchelder et al.

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