Method of repetitively imaging a mask pattern on a substrate, an

Details Method of repetitively imaging a mask pattern on a substrate, an Method of repetitively imaging a mask pattern on a substrate, an

Filed on

1995-08-01

Date issued

1997-10-07

Examiner

Rosasco, S.

Patent Class

Radiation imagery chemistry: process, composition, or product th

SubClass

Registration or layout process other than color proofing

Other Related Categories

430394, 356401, G03F 900

Type

Patent

Status

active

Patent number

056746504

Description

ABSTRACT:
A method and apparatus for repetitively imaging a mask pattern (C) on a substrate (W) are described. The focusing of the projection lens system used for imaging and various other parameters of the apparatus and the projection lens system (PL), as well as illumination doses can be measured accurately and reliably, and measuring devices of the apparatus can be calibrated, by measuring an image of a new asymmetrical test mark formed in the photoresist on the substrate (W) by means of a projection beam (PB).

REFERENCES:
patent: 4251160 (1981-02-01), Bouwhuis et al.
patent: 4356392 (1982-10-01), Wittekoek et al.
patent: 4778275 (1988-10-01), Van Den Brink et al.
patent: 5144363 (1992-09-01), Wittekoek et al.
patent: 5191200 (1993-03-01), Van Der Werf et al.
patent: 5538819 (1996-07-01), DeMarco et al.
R. Pforr et al, "in-process Image Detecting Technique for Determination of Overlay and Image Quality for ASM-L Wafer Stepper", SPIE vol. 1674, Optical/Laser Microlighography V, 1992, pp. 594-608.
J. Wangler et al, "Design principles for an illumination system using an excimer laser as a light source", SPIE vol. 1138, 1989, pp. 129-136.

Affiliated with

Also associated with

Rating

Method of repetitively imaging a mask pattern on a substrate, an does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of repetitively imaging a mask pattern on a substrate, an, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of repetitively imaging a mask pattern on a substrate, an will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2355624