Polymeric thin film, process for producing the same and products

Details Polymeric thin film, process for producing the same and products Polymeric thin film, process for producing the same and products

1984-09-28

1987-01-13

Robinson, Ellis P.

Stock material or miscellaneous articles

Web or sheet containing structurally defined element or...

Physical dimension specified

360134, 360135, 360136, 427 41, 427128, 427131, 428421, 428422, 428694, 428695, 428463, 428900, G11B 572

Patent

active

046364358

ABSTRACT:
The present invention concerns a process for producing a novel polymeric thin film having high density, high hardness and high toughness on the surface of a substrate by plasma polymerization. This process comprises providing a gas containing at least one compound selected from halogenated alkanes, alkanes, hydrogen and halogens in specific combinations for plasma polymerization, the atomic ratio of halogen/hydrogen in the aforesaid gas being 0.1 to 5 and the electron temperature of the plasma in the reaction zone being 6,000.degree. K. or higher and lower than 30,000.degree. K. The polymeric thin film obtained is useful on various articles for the purpose of protection, surface hardening, rust proofing, scratch proofing, providing gas barrier, etc. In particular, it is suitable as the protective film of magnetic recording media.

REFERENCES:
patent: 3940506 (1976-02-01), Heinecke
patent: 4188426 (1980-02-01), Auerbach
patent: 4242188 (1980-12-01), Ninomi
patent: 4252848 (1981-02-01), Datta
patent: 4382101 (1983-05-01), Polak
patent: 4390601 (1983-06-01), Ono
patent: 4419404 (1983-12-01), Arai
patent: 4429024 (1984-01-01), Ueno
patent: 4565734 (1986-01-01), Arai
patent: 4582746 (1986-04-01), Shirahata
Reprints of Papers Presented by the Division of Organic Coatings and Plastics Chemistry, American Chemical Society, 1982.

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