Process and apparatus for treatment of fluids, particularly desa

Chemistry: electrical and wave energy – Processes and products – Electrostatic field or electrical discharge

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

204301, B01D 1302

Patent

active

046362967

ABSTRACT:
The invention refers to a process and a device for the performance of a process for the treatment of liquids, particularly for the demineralization of aqueous solutions, whereby the liquid being treated is conducted through successive chambers of treatment, wherein in a first stage of the treatment demineralization takes place by means of ion displacement and in a second stage of post-treatment by means of ion desorption the salts that are removed from the treated liquids are led into so-called brine chambers, and are washed out of these chambers into a channel or other receiver by means of a transporting liquid.

REFERENCES:
patent: 3645884 (1972-02-01), Gilliland
patent: 3677923 (1972-07-01), Bier
patent: 3686089 (1979-08-01), Korngold et al.
patent: 3704218 (1972-11-01), Kato et al.
patent: 4111780 (1978-09-01), Marayama et al.
patent: 4115225 (1978-09-01), Carsi
patent: 4141825 (1979-02-01), Conger
patent: 4148708 (1979-04-01), Grant
patent: 4160713 (1979-07-01), Matzuzaki et al.
patent: 4284492 (1981-08-01), Karn
patent: 4295950 (1981-10-01), Cole
patent: 4465573 (1984-08-01), O'Hare

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process and apparatus for treatment of fluids, particularly desa does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process and apparatus for treatment of fluids, particularly desa, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process and apparatus for treatment of fluids, particularly desa will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2354341

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.