Method and apparatus for depositing conducting oxide on a substr

Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating

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204192R, 204298, C23C 1500

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active

044288107

ABSTRACT:
There is described a method and an apparatus for depositing oxide, such as zinc oxide, on a substrate by R.F. magnetron sputtering. The oxide deposit is "switched" from a non-conducting to a highly conducting material by a second discharge caused by a voltage applied to a screen grid immediately in front of the substrate, or is rendered conducting by a heating step.

REFERENCES:
patent: 3477936 (1969-11-01), Gillery et al.
patent: 3506556 (1970-04-01), Gillery et al.
Hanak, Proc. 6th Internl. Vacuum Cong. 1974, Japan, J. Appl. Phys. Suppl. 2, Part 1, 1974, p. 809.
Dakss et al., IBM Tech. Disc. Bull., Oct. 1970, vol. 13, No. 5, pp. 1176-1178.
Michel et al., IBM Tech. Disc. Bull., vol. 13, No. 5, Oct. 1970, p. 3790.

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