Plastic and nonmetallic article shaping or treating: processes – Gas or vapor deposition of article forming material onto...
Patent
1991-06-21
1993-07-27
Chiesa, Richard L.
Plastic and nonmetallic article shaping or treating: processes
Gas or vapor deposition of article forming material onto...
295272, 164 46, 264 82, 264129, 427250, 427253, B29C 4150
Patent
active
052308472
ABSTRACT:
The present invention provides a method of forming a free standing shape made of a material containing refractory metal, which entails providing a mandrel in a CVD enclosure, injecting a refractory halide gas and a reducing gas in the enclosure, reacting the gases in the enclosure to generate a material containing refractory metal, growing a layer of the material containing refractory metal on the mandrel and removing the mandrel to obtain the free standing shape, wherein the reducing gases is a silicon hydride gas or a mixture thereof.
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Chemical Abstracts, vol. 104, No. 2, Jan. 1986, p. 238, Abstract No. 104:9492k, & JP-A-60 145 376, Jul. 31, 1985, Y. Shiotani, et al., "Formation of Tungsten Silicide Films".
Arai Juichi
Claverie Pierre
Friedt Jean-Marie
Jalby Pierre
Kimura Masao
Chiesa Richard L.
L'Air Liquide, Societe Anonyme l'Etude et l'Exploitation des Pro
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