Metalorganic vapor phase epitaxial growth of group II-VI semicon

Metal treatment – Process of modifying or maintaining internal physical... – Chemical-heat removing or burning of metal

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29576E, 29572, 148DIG63, 148DIG64, 148DIG80, 148DIG110, 156610, 156613, 156614, 156DIG72, 156DIG82, H01L 21365, H01L 3100

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045683972

ABSTRACT:
A method for growing a Group II-VI epitaxial layer on a substrate, said epitaxial layer having an electron mobility greater than 1.5.times.10.sup.5 cm.sup.2 /V-sec at 77.degree. K. and a carrier concentration less than 4.times.10.sup.15 (cm.sup.-3) is described. The method includes the steps of directing a plurality of vapor flows towards the substrate including a Group II metalorganic vapor having a mole fraction in the range of 3.0.times.10.sup.-4 to 4.5.times.10.sup.-4, a Group VI metalorganic vapor having a mole fraction in the range of 2.9.times.10.sup.-3 to 3.5.times.10.sup.-3 and a Group II elemental metal vapor having a mole fraction in the range of 2.6.times.10.sup.-2 to 3.2.times.10.sup.-2. The source of Group II metal is heated to at least 240.degree. C. while radiant energy is directed toward the reactor vessel to warm the zone of the reactor vessel between the Group II metal source and the substrate to at least 240.degree. C. The directed flows of Group II metalorganic vapor, Group VI metalorganic vapor and Group II metal vapor then chemically react to form the epitaxial layer.

REFERENCES:
patent: 3218203 (1965-11-01), Ruehrwein
patent: 3619282 (1971-11-01), Manley et al.
patent: 4439267 (1984-03-01), Jackson
"High Quality Hg.sub.1-x Cd.sub.x Te Epitaxial Layers by the Organometallic Process" by S. K. Ghandhi et al., Applied Physics Letter, vol. 44, No. 9, (Apr. 1984), pp. 779-781.
"Low Temperature CVD Growth of Epitaxial HgTe on CdTe" by T. F. Kuech, Solid-State Science and Technology, vol. 128, No. 5, (May 1981), pp. 1142-1144.
"The Growth of Cd.sub.x Hg.sub.1-x Te Using Organometallics" by J. B. Mullin et al., J. Vac. Sci. Technol., 21(1), May/Jun. 1982, pp. 178-181.
"Metal-Organic Vapor Deposition of CdTe and HgCdTe Films" by W. E. Hoke et al., Journal of Applied Physics, vol. 54, No. 9 (Sep. 1983), pp. 5087-5089.
"The Use of Metal-Organics in the Preparation of Semiconductor Materials" by H. M. Manasevit et al., Solid State Science, (Apr. 1971), vol. 118, No. 4, pp. 644-647.
"Vapour Phase Epitaxy of Cd.sub.x Hg.sub.1-x Te Using Organometallics" by J. B. Mullin et al., J. Phys. D: Appl. Phys., 14 (1981), pp. L149-L151.
"Growth by MOVPE and Characterisation of Cd.sub.x Hg.sub.1-x Te" by S. J. C. Irvine et al., Journal of Crystal Growth, (1981), pp. 107-115.
"Organometallic Growth of II-VI Compounds" by J. B. Mullin et al., Journal of Crystal Growth, (1981), pp. 92-106.

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