Apparatus for coating resist and developing the coated resist

Details Apparatus for coating resist and developing the coated resist Apparatus for coating resist and developing the coated resist

1999-08-31

2000-04-18

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

118 56, 118 58, 118 69, 118111, 118232, G03F 900, B05C 1102, B05C 1300

Patent

active

060513497

ABSTRACT:
Disclosed is a resist coating-developing method and apparatus including (a) a setting step for setting a target value and an allowable range thereof, (b) a resist-coating step, (c) a pre-baking step, (d) a first cooling step, (e) a light-exposure step, (f) a line width measuring step for measuring a line width of a latent image, (g) a post-baking step, (h) a second cooling step, (i) a developing step, (j) a judging step determining whether or not the value of the line width of the latent image measured in the step (f) falls within the allowable range of the target value set in the step (a), (k) a calculating step for calculating a difference between the measured value of the latent image line width and the target value, and (l) a correcting step for correcting the process condition in at least one previous step.

REFERENCES:
patent: 5393624 (1995-02-01), Ushijima
patent: 5656182 (1997-08-01), Marchman et al.
patent: 5968691 (1999-10-01), Yoshioka et al.
C.J. Raymond, et al, "Scatterometry for CD Measurements of Etched Structures", SPIE, vol. 2725, Apr. 1996 pp. 720-728.
K.P. Bishop, et al. "Grating Line Shape Characterization Using Scatterometry", SPIE, vol. 1545, Feb. 1991, pp. 64-73.
J. Sturtevant, et al., Proceedings of the SPIE, vol. 2196, pp. 332-359, "Use of Scatterometric Latant Image Detector in Closed Loop Feedback Control of Linewidth", Feb. 1994.
Pat. Abs of Japan, vol. 96, No. 8, Aug. 1996, JP8-111370, Apr. 1996.

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