Method of producing phase shifting mask

Details Method of producing phase shifting mask Method of producing phase shifting mask

1998-06-10

2000-04-18

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G06F 900

Patent

active

060513454

ABSTRACT:
A method for producing a phase shifting mask comprising the steps of first forming a phase shifting layer capable of shifting incoming light by a 360.degree. phase shift angle over a transparent substrate, or forming two phase shifting layers, which are each capable of shifting incoming light by a 180.degree. phase shift angle, before carrying out the steps required to fabricate the phase shifting mask in a conventional method. With the additional phase shifting layer or layers, damage to the transparent substrate due to etching is prevented. Moreover, phase errors caused by defective regions in the phase shifting mask can be removed, easily resulting in the formation of a defect-free mask.

REFERENCES:
patent: 5272024 (1993-12-01), Lin
patent: 5561010 (1996-10-01), Hanyu et al.

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