Positive resist for high energy radiation

Details Positive resist for high energy radiation Positive resist for high energy radiation

1977-06-13

1978-10-24

Welsh, John D.

Gas separation: apparatus

Electric field separation apparatus

Electrode cleaner, apparatus part flusher, discharger, or...

96115R, 20415919, G03C 168

Patent

active

041219368

ABSTRACT:
A film of poly(methacrylamide) is heated to partially form imide bonds with elimination of ammonia, and such imide bonding causes crosslinking in the polymer to form a crosslinked polymer film. This film can be advantageously adapted as a positive resist capable of forming a positive image by exposure to radiation such as electron beams. The minimum incident charge required for such exposure is of the order of 10.sup.-7 coulomb/cm.sup.2, which is far lower than the level required in the use of conventional resists. The resist provided according to this invention is also capable of forming an excellent heat-resistant positive resist image by short-time exposure to radiation.

REFERENCES:
patent: 3964908 (1976-06-01), Bargon et al.

Affiliated with

Also associated with

Rating

Positive resist for high energy radiation does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Positive resist for high energy radiation, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive resist for high energy radiation will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2334978