Substrate processing apparatus, substrate transport apparatus an

Details Substrate processing apparatus, substrate transport apparatus an Substrate processing apparatus, substrate transport apparatus an

1998-03-16

2000-04-18

Bueker, Richard

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

414222, B65H 100

Patent

active

06051101&

ABSTRACT:
A unit arrangement part comprises a chemical cabinet on its lowermost part, while coating units for forming a resist film on a substrate and developing units for developing the substrate after exposure are arranged on four corners of an apparatus above the chemical cabinet. Further, multistage thermal processing units for thermal-processing the substrate are arranged on front and rear portions of the apparatus above these wet processing units. A cleaning unit for supplying a cleaning liquid such as pure water and cleaning the substrate is arranged on a front side of the apparatus between the coating units as a substrate processing unit. Thus provided is a substrate processing apparatus having excellent workability in maintenance with a high degree of freedom in arrangement of processing units.

REFERENCES:
patent: 5571325 (1996-11-01), Ueyama et al.
patent: 5826129 (1998-10-01), Hasebe et al.

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