Semiconductor light exposure apparatus

Details Semiconductor light exposure apparatus Semiconductor light exposure apparatus

1995-01-24

1998-01-06

Grimley, Arthur T.

Photocopying

Projection printing and copying cameras

Step and repeat

355 69, H01L 2130

Patent

active

057060762

ABSTRACT:
A semiconductor light exposure apparatus includes an excitation light source, a light beam generating device, a controller and a contracting optical system. The light beam generating device generates a fundamental wavelength laser light beam when excited by a light beam from the excitation light source, and wavelength-converts the fundamental wavelength laser light beam into a second harmonics laser light beam by a first resonator having a first non-linear optical crystal element while also converting the second harmonics laser light beam into a second harmonics laser light beam by a second resonator having a second non-linear optical crystal element. The controller controls an output of the excitation light source in order to control an output of the fourth-order harmonics laser light beam from the light beam generating device. The contracting optical system projects a pattern in a contracted size on a wafer by the fourth-order harmonics laser light beam outputted from the optical beam generating device.

REFERENCES:
patent: 5097291 (1992-03-01), Suzuki
patent: 5309198 (1994-05-01), Nakagawa
patent: 5367531 (1994-11-01), Eguchi et al.
patent: 5459547 (1995-10-01), Shiozawa

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