Method and system for evaluating distribution of absorption ligh

Details Method and system for evaluating distribution of absorption ligh Method and system for evaluating distribution of absorption ligh

1995-12-26

1997-05-27

Gonzalez, Frank

Optics: measuring and testing

By dispersed light spectroscopy

Utilizing a spectrometer

356401, 356357, G01B 902

Patent

active

056337132

ABSTRACT:
A system for evaluating a distribution of an absorption light amount in a resist comprises a diffractive light intensity distribution calculating unit for calculating a diffractive light intensity distribution on a plane of a pupil of a projection exposing apparatus, a light absorption rate calculating unit for calculating, on the basis of an incidence angle and a thin-film interference effect of each of diffractive light intensity components of the diffractive light intensity distribution passing through the pupil and being incident on a wafer surface of the projection exposing apparatus, a light absorption rate of each of the diffractive light intensity components in a resist of the projection exposing apparatus, a weight calculating unit for calculating a weight of each diffractive light intensity component, on the basis of the light absorption rate of each diffractive light intensity component calculated by the light absorption rate calculating unit, a multiplying unit for multiplying each diffractive light intensity component of the diffractive light intensity distribution by the weight of each diffractive light intensity component calculated by the weight calculating unit, and an integrating unit for integrating, in the plane of the pupil, each diffractive light intensity component multiplied with the weight obtained by the multiplying unit, thereby obtaining an absorption light amount distribution in the resist.

REFERENCES:
T. A. Brunner, "Optimization of Optical Properties of Resist Processes", SPIE vol. 1466, Advances In Resist Technology and Processing VIII (1991), (pp. 297-308); Feb. 1991.
Michael Yeung, "Modeling Aerial Images In Two and Three Dimensions", Proc. Kodak Microelectronics Seminar Interface '85, (pp. 115-126); 1986.
Douglas A. Bernard, et al., "Thin-film Interference Effects In Photolithography For Finite Numerical Apertures", Optical Society of America, vol. 8, No. 1, (pp. 123-133); Jan. 1991.

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