Method and apparatus for in situ removal of contaminants from io

Details Method and apparatus for in situ removal of contaminants from io Method and apparatus for in situ removal of contaminants from io

1995-08-28

1997-05-27

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

2504922, 250251, H01J 3736

Patent

active

056335067

ABSTRACT:
Method and apparatus are provided for removal of contaminant material adhered to interior surfaces of an ion beam neutralization apparatus and ion implantation apparatus of an ion beam implanter. Contaminant material is removed from the neutralization apparatus and the implantation apparatus using a plasma glow discharge. The contaminant material is also removed from the neutralization apparatus by expanding the ion beam.

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patent: 5427621 (1995-06-01), Gupta
patent: 5466942 (1995-11-01), Sakai et al.
patent: 5554854 (1996-09-01), Blake
Materials Research Corporation, "The Basics of Plasmas," Hinson, Copyright 1984, pp. 1-36.

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