Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Mixing of two or more solid polymers; mixing of solid...
Patent
1995-04-26
1997-05-27
Dean, Ralph H.
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
Mixing of two or more solid polymers; mixing of solid...
528 25, 528 26, 524113, 524315, 524351, 524378, 524588, C08F28312
Patent
active
056333323
DESCRIPTION:
BRIEF SUMMARY
DESCRIPTION
The present invention relates to polymers based on polyarylene siloxanes and on free-radical-polymerizable monomers, a process for their preparation and their use.
Polymers which are prepared with the aid of free-radical-forming initiators by polymerization of organic monomers containing a C--C double bond have, owing to their properties matched to the respective application, found extremely wide use.
Polysiloxane compounds are also technologically important, with the aliphatic poly(dimethylsiloxanes) representing the most important class of materials (J. J. Lebrun, H. Porte in: "Comprehensive Polymer Science", Volume 5, Chapter 35: "Polysiloxanes", pp. 593-609, Pergamon Press New York, 1989).
Increasing importance is being attached to aromatic polysiloxanes, the so called polyarylene siloxanes. These can be used, for example, for release layers in photocopiers (EP-A-030 817), as photoresist materials, as flame-resistant thermoplastics (EP-A-398 049), as plasticizers for polycarbonates (DE-A-28 32 342) and as constituents of powder surface coating systems (DE-A-41 29 000).
Polymers which are prepared both from free-radical-polymerizable monomers and also from aliphatic siloxane compounds can be used for impregnating and coating textiles (DE-C3-26 10 372; U.S. Pat. No. 4,153,640).
It is an object of the invention to provide new polymers based on aromatic polysiloxanes.
This object is achieved according to the invention by providing polymers which can be obtained by free-radical polymerization of free-radical-polymerizable monomers in the presence of polysiloxanes dissolved in a solvent, where the free-radical-polymerizable monomers used are at least one of the formula I, ##STR3## where R.sup.1 and R.sup.2 are, independently of one another, hydrogen, COOH, C.sub.1 -C.sub.18 -alkyl, cyclohexyl, C.sub.1 -C.sub.4 -alkyl-cyclohexyl, C.sub.6 -C.sub.10 -bicycloalkyl, C.sub.6 -C.sub.18 -tri-cycloalkyl, from 1 to 3, or ##STR4## where R.sup.5 is selected from among alkenyl (2 to 4 carbon atoms), aryl, CHO and CH.sub.3 (CH.sub.2).sub.z CO.sub.2 --, -C.sub.5 -alkyl, --COOH, --CO.sub.2 -alkyl (having from 1 to 4 carbon atoms) and CHO, where the sum of the groups --COOH and CO.sub.2 -alkyl is at most two and CO--O--CO of the formula III, ##STR5## where R.sup.9 and R.sup.10 are identical or different and are, independently of one another, a C.sub.1 -C.sub.12 -alkyl radical, a C.sub.6 -C.sub.14 -aryl radical, or an unsubstituted or substituted vinyl radical, and are, independently of one another, hydrogen, a C.sub.1 -C.sub.3 -alkyl radical or a substituted or unsubstituted C.sub.6 -C.sub.14 -aryl radical and --SO.sub.2 --, --CH.sub.2 -- or a cyclohexylidene group which can be unsubstituted or substituted, preferably alkyl-substituted, or is a single chemical bond and where to 200.
The alkyl radicals R.sup.9 and R.sup.10 can be straight-chain or branched. Preference is given to a C.sub.1 -C.sub.3 -alkyl radical.
The aryl radicals R.sup.9 and R.sup.10 can be substituted by C.sub.1 -C.sub.6 -alkyl radicals, halogen atoms (F, Cl, Br) and also by vinyl groups. Preference is given to a phenyl radical.
The vinyl radicals R.sup.9 and R.sup.10 can be substituted by C.sub.6 -C.sub.12 -aryl radicals, halogen atoms (F, Cl, Br) and by C.sub.1 -C.sub.6 -alkyl radicals.
The aryl radicals R.sup.11 to R.sup.14 can be substituted by C.sub.1 -C.sub.6 -alkyl groups, halogen atoms (F, Cl, Br) and by vinyl groups.
The cyclohexylidene group X can be substituted by up to six C.sub.1 -C.sub.6 -alkyl groups, C.sub.6 -C.sub.12 -aryl groups and/or by halogen atoms (F, Cl, Br).
Suitable alkyl radicals for R.sup.1 and/or R.sup.2 are, in particular, ethylhexyl, octyl, 3,5,5-trimethylhexyl, decyl, dodecyl, hexyldecyl, octadecyl, lauryl, methyl, ethyl, propyl, butyl, isobutyl, tertiary butyl, pentyl and hexyl.
As alkylcyclohexyl radicals R.sup.1 and/or R.sup.2, preference is given to the 4-t-butylcyclohexyl radical. Suitable bicycloalkyl and tricycloalkyl radicals R.sup.1 and/or R.sup.2 are mainly radicals containing 6-membered rings, e.g. th
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Kalus Reinhardt
Land Horst-Tore
Schubert Walter
Dean Ralph H.
Hoechst Aktiengesellschaft
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