Radiation imagery chemistry: process – composition – or product th – Holographic process – composition – or product
Patent
1994-08-22
1996-08-20
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Holographic process, composition, or product
430 2, 359 12, 359 15, 359 20, 359 19, 359 25, G03H 120
Patent
active
055477860
ABSTRACT:
A method and system for fabricating a multiple holographic element. The method comprises the steps of forming a master multiple holographic element having an absorption grating pattern that produces a given index of refraction pattern across the master multiple holographic element, coating the master holographic element with a layer of a photopolymer, and directing a recording beam to and through the master holographic element and into the photopolymer layer. The absorption grating pattern of the master holographic element modulates the amplitude of the recording beam, and the modulated recording beam causes the monomers of the photopolymer to form a monomer pattern that produces the given index of refraction pattern across the photopolymer layer. The method further comprises the steps of fixing the monomers of the photopolymer layer in that monomer pattern to form thereby a copy of the multiple holographic element, and removing the photopolymer layer from the master holographic element.
REFERENCES:
patent: 3658526 (1972-04-01), Haugh
patent: 3779492 (1973-12-01), Grumet
patent: 4111519 (1978-09-01), Gillis et al.
patent: 4735486 (1988-04-01), Lieb
patent: 4857425 (1989-08-01), Phillips
patent: 4904033 (1990-02-01), Ikeda et al.
patent: 4942112 (1990-07-01), Monroe et al.
patent: 5162927 (1992-11-01), Moss et al.
patent: 5185815 (1993-02-01), Brandstetter
Nakejima et al "Copied Phase Hologram of Photoresist" Fujitsu Sci. tech., J. Sep. 1970 pp. 69-90.
Beesley et al "The Use of Photoresist as a Holographic Recording Medium." Appl. Opt. 9 (Dec. 1970) 2720-2724.
Smothers, W. et al., "Photopolymers For Holography" proceeding SPIE Conference on Practical Holography IV, vol. 1212, 1990.
Weber, A., et al., "Hologram Recording in DuPont's New Photopolymer Materials," proceeding SPIE Conference on Practical Holography IV, vol. 1212, 1990.
Weber, A., "HRF-600 and HRF-610 Films", DuPont Imaging Systems FAX dated Mar. 8, 1991.
Brandstetter, R., et al., "Photopolyer Applications for Radio Frequency Recording and Processing," SPSE Conference, Washington, D.C., 1978.
Kogelnik, H., "Coupled Wave Theory for Thick Hologram Gratings," Bell System Technical Journal, vol. 48, No. 9, Nov. 1969.
Brandstetter, R. W. and Fonneland, N. J., "Photopolyer Elements for an Optical Correlator System" Grumman Aerospace Corporation.
Gambogi, et al., "Holographic Transmission Elements Using Improved Photopolymer Films," SPIE International Symposium on Optical Science and Engineering, San Diego, 1991.
Brandstetter, R. W., et al., "Electronic Countermeasures Signal Recognition--Brassboard Development and Test," Grumman Aerospace Corp. ADR 17-08-80.1, Apr. 1980.
Brandstetter, R. W., et al., "Electronic Countermeasures (ECM) Signature Recognition," GAC-ADR 177-08-77.1, Oct. 1977.
Pernick, B. J., et al., "Corporate Research Center Multiple Holographic Lens Facility," Grumman Corporate Research Center, Report RM-861, Aug. 1987.
Sullivan, E., et al., "An Improvement to the MHL Facility Optical System," Grumman Corporate Research Center, Research Note RN-501, Sep. 1983.
Brandstetter Robert W.
Fonneland Nils J.
Anderson Terry J.
Angebranndt Martin
Bowers Jr. Charles L.
Hoch Jr. Karl J.
Northrop Grumman Corporation
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