Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1994-10-07
1997-05-27
Young, Christopher G.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430177, 430188, 4302701, G03F 7021
Patent
active
056331126
ABSTRACT:
A photosensitive resin composition comprising (a) a polymer having carboxyl groups (b) a photoacid generator which generates an acid when irradiated with light, and (c) an aliphatic amine is capable of development with ease by use of a wide variety of aqueous solvents.
REFERENCES:
patent: 4980268 (1990-12-01), Bartmann et al.
Ishida Mina
Miwa Takao
Numata Shun-ichi
Okabe Yoshiaki
Takahashi Akio
Hitachi , Ltd.
Hitachi Chemical Company Ltd.
Young Christopher G.
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