Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1992-09-03
1996-08-20
Neville, Thomas R.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430 22, 430269, 430311, 430396, 378 34, 378 35, G03F 900
Patent
active
RE0353159
ABSTRACT:
The present invention relates to a microminiaturization technique to achieve the miniaturization and higher integration of IC chips and to the improvement of a mask used in its manufacturing process. In other words, the phase of lights transmitted through the mask is controlled within one mask pattern. Specifically, a transparent film is formed in such a manner that it covers a mask pattern along a pattern formed by magnifying or demagnifying the mask pattern, or otherwise a groove is formed in a mask substrate. A phase difference of 180.degree. is generated between the lights transmitted through the mask substrate and the transparent film or the groove, causing interference with each light to offset each other. Therefore, the pattern transferred onto a wafer has an improved resolution, being used in the invention.
REFERENCES:
patent: 4360586 (1982-11-01), Flanders et al.
patent: 4890309 (1989-12-01), Smith et al.
patent: 5045417 (1991-09-01), Okamoto
Levenson, et al, "Improving Resolution in Photolithography with a Phase-Shifting Mask", IEEE Transactions on Electron Devices, vol. ED-29, No. 12, Dec. 1982.
Levenson, et al, "The Phase Shifting Mask II: Imaging Simulations and Submicron Resist Exposures", IEEE Transactions on Electron Devices, vol. ED-31, No. 6, Jun. 1984.
Nitayama, et al, "New Phase Shifting Mask with Self-Aligned Phase Shifters for a Quarter Micron Photolithography", IEDM 89-57 1989.
Ku, et al, "Use of a Phase Shifting X-Ray Mask", Semiconductor Research Corporation, Jun. 23, 1987.
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