Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1992-05-13
2000-01-25
Chapman, Mark
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
2504922, G03F 900
Patent
active
06017658&
ABSTRACT:
Improvement in resolution in terms of minimum feature sizes and proximity fects in an electronic mask is attained by making the mask using a high voltage electron beam which deflects or blocks backscattered electrons. The novel mask structure comprises a transparent support, an absorber layer disposed on said support, a dielectric layer disposed on said absorber layer, and a resist layer disposed on said dielectric layer. It is the dielectric layer which is credited for improving resolution in said mask which can be used a multiple number of times in printing a pattern for various applications, including electronic devices and integrated circuits.
REFERENCES:
patent: 4463265 (1984-07-01), Owen et al.
patent: 4764441 (1988-08-01), Ohta et al.
Dobisz Elizabeth A.
Marrian Christie R. K.
Peckerar Martin C.
Rhee Kee W.
Chapman Mark
Kap George
McDonnell Thomas E.
The United States of America as represented by the Secretary of
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