System for measuring the curvature of a semiconductor wafer

Details System for measuring the curvature of a semiconductor wafer System for measuring the curvature of a semiconductor wafer

1991-11-18

1993-07-13

Nelms, David C.

Radiant energy

Photocells; circuits and apparatus

Optical or pre-photocell system

356376, G01V 904

Patent

active

052276414

ABSTRACT:
A system for measuring the curvature of a surface includes a laser for emitting a beam of light to be incident upon the surface; a photodetector for detecting light reflected by the surface; a first stage for selectively moving the surface in a direction normal to the direction of the incident beam; a second stage for selectively moving the photodetector in a direction normal to the reflected beam; a sensor connected to the photodetector for detecting the displacement of the reflected beam relative to the photodetector.

REFERENCES:
patent: 3406292 (1968-10-01), Geier et al.
patent: 4672196 (1987-06-01), Canino
patent: 4900940 (1990-02-01), Nakamura

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