Lithography apparatus using scanning tunneling microscopy

Radiant energy – Photocells; circuits and apparatus – Optical or pre-photocell system

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2504922, 250307, H01J 314

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active

052276260

ABSTRACT:
A lithography apparatus is provided with an SXM base, which has a plurality of cantilevers movably supporting probes at their free ends, respectively. The SXM base is secured to a mirror base by a support arm via inchworm devices, such that it faces a silicon wafer placed on a wafer stage. The silicon wafer has an alignment pattern formed thereon, while the SXM base has a reference alignment pattern formed thereon which is similar to the alignment pattern. A voltage is applied to the probes at a predetermined point of time under the control of a controller while a gas containing a film-forming material is being supplied onto the wafer, whereby the film-forming material is adsorbed in a desired portion of the surface of the wafer.

REFERENCES:
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patent: 5043578 (1991-08-01), Guethner et al.
patent: 5047649 (1991-09-01), Hodgson et al.
Article entitled Nanostructure Fabrication by Scanning Tunneling Microscope by Masakazu Baba et al., Published in Journal of Applied Physics, vol. 29, No. 12, Dec. 1990, pp. 2854-2857.
Article entitled Direct Writing with the Scanning Tunneling Microscope by E. E. Ehrichs, et al., Published in J. Vac. Sci. Technol. A6 (2), Mar./Apr. 1988, pp. 540-543.
Article entitled Nanometer-Scale Wafer Alignment For Lithography Using Tunneling, Published in IBM Technical Disclosure Bulletin, vol. 33, No. 2, Jul. 1990, pp. 260-261.
Article entitled Applications of Scanning Probe Microscopy in the Semiconductor Industry, by I. Smith, et al., Published in Solid State Technology, Dec. 1990, pp. 53-56.
IBM Journal of Research and Development, vol. 32, No. 4, Jul. 1988, pp. 462-493.
Nanotechnology 1 (1990), "The Scanning Tunneling Microscope As A Tool For Nanofabrication", pp. 67-80.

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