Method and apparatus for regenerating etching liquid

Details Method and apparatus for regenerating etching liquid Method and apparatus for regenerating etching liquid

1994-05-20

1995-10-10

Powell, William

Etching a substrate: processes

Nongaseous phase etching of substrate

Recycling, regenerating, or rejunevating etchant

216101, 216108, 252 792, B44C 122, C23F 102

Patent

active

054567955

ABSTRACT:
An aqueous mixture etchant containing hydroiodic acid and ferric chloride is suitable for etching ITO to form a minute electrode pattern as used in a liquid crystal display device. When the etchant has caused a decrease in etching performance due to a compositional change, it can be effectively regenerated by replenishing appropriate amounts of hydrochloric acid and pure water, or an appropriate amount of a dilute hydrochloric acid at a constant concentration, while minimizing the use of hydroiodic acid and ferric chloride which are rather expensive compared with hydrochloric acid and pure water.

REFERENCES:
patent: 3526560 (1970-09-01), Thomas
patent: 3933544 (1976-01-01), Haas
patent: 4472236 (1984-09-01), Tanaka et al.

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