Process for fabricating quantum-well devices utilizing etch and

Metal working – Method of mechanical manufacture – Assembling or joining

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29571, 29578, 29580, 148175, 148DIG50, 148DIG110, 148DIG160, 148DIG169, 156612, 156613, 156643, 156648, 156662, 156DIG61, 156DIG70, 156DIG103, 357 4, 357 16, 357 22, H01L 21203, H01L 21302, H01L 29161

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045759243

ABSTRACT:
The present invention teaches a process for fabrication of quantum-well devices, in which the quantum-wells are configured as small islands of GaAs in an AlGaAs matrix. Typically these islands are roughly cubic, with dimensions of about 100 Angstroms per side. To fabricate these, an n- on n+ epitaxial GaAs structure is grown, and then is etched to an e-beam defined patterned twice, and AlGaAs is epitaxially regrown each time. This defines the quantum wells of GaAs in an AlGaAs matrix, and output contacts are then easily formed.

REFERENCES:
patent: 3626257 (1971-12-01), Esaki et al.
patent: 4103312 (1978-07-01), Chang et al.
patent: 4194935 (1980-03-01), Dingle et al.
patent: 4257055 (1981-03-01), Hess et al.
patent: 4261771 (1981-04-01), Dingle et al.
patent: 4450463 (1984-05-01), Chin
patent: 4503447 (1985-03-01), Iafrate et al.
Vojak et al., "Low-Temperature--Quantum-Well AlGaAs--Deposition" J. Appl. Phys., 50(9) Sep. 1979, pp. 5830-5834.
Vojak et al., "Tunnel-Injection--Quantum-Well AlGaAs--Deposition, Ibid., 50(9) Sep. 1979, pp. 5835-5840.
Ralls et al., "Discrete Resistance Switching--Noise" Physical Rev. Lett., vol. 52, No. 3, Jan. 16, 1984, pp. 228-231.
Lebwohl et al., "Electrical Transport Properties in a Superlattice" J. Appl. Phys., vol. 41, No. 6, May 1970, pp. 2664-2667.
TSU et al. "Nonlinear Optical Response--Electrons in a Superlattice" Appl. Phys. Lett., vol. 19, No. 7, Oct. 1, 1971, pp. 246-248.
Chang et al., "Resonant Tunneling in Semiconductor Double Barriers" Appl. Phys. Lett., vol. 24, No. 12, Jun. 15, 1974, pp. 593-595.
Sollner et al., "Resonant Tunneling Through Quantum Wells--" Appl. Phys. Lett., vol. 43(6) Sep. 15, 1983, pp. 588-590.

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