Silicon nitride formation and use in self-aligned semiconductor

Details Silicon nitride formation and use in self-aligned semiconductor Silicon nitride formation and use in self-aligned semiconductor

1984-10-01

1986-03-18

Hearn, Brian E.

Metal working

Method of mechanical manufacture

Assembling or joining

29578, 29576B, 148 15, 148DIG82, 148DIG112, 148DIG114, H01L 21265

Patent

active

045759219

ABSTRACT:
A method of forming a silicon nitride coating in situ on a silicon surface by ion milling. The ion milling and silicon nitride formation process are uniquely integrated in semiconductor manufacturing methods to provide several benefits, including contact areas being substantially registered with and self-aligned with functional regions.

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