Photosensitive azide composition with alkali soluble polymer and

Details Photosensitive azide composition with alkali soluble polymer and Photosensitive azide composition with alkali soluble polymer and

1984-05-31

1986-01-21

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430194, 430325, 430927, 260349, G03C 152, G03C 171, G03F 726

Patent

active

045657688

ABSTRACT:
A photosensitive composition comprising an equimolar condensation product of an aromatic azide compound having an aldehyde group and isophorone, and an alkali-soluble polymeric compound is a negative-type photoresist with a high resolution suitable for the fabrication of semiconductor devices.

REFERENCES:
patent: 2940853 (1960-06-01), Sagura et al.
patent: 3539559 (1970-11-01), Ruckert
patent: 3595656 (1971-07-01), Ruckert et al.
patent: 3749713 (1973-07-01), Clecak et al.
patent: 4356247 (1982-10-01), Aotani et al.
patent: 4407927 (1983-10-01), Kamoshida et al.
Partial English Translations of Japanese Patent Publication No. 45-22082.
Partial English Translation of Japanese Patent Publication No. 53-34902.

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