Photoresist article having a portable, conformable, built-on mas

Details Photoresist article having a portable, conformable, built-on mas Photoresist article having a portable, conformable, built-on mas

1989-08-02

1993-08-31

Bowers, Jr., Charles J.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Diazo-type process, i.e., producing dye image by reacting...

430141, 430176, 430311, 430312, 430326, 430327, 430328, G03C 518, G03F 112, G03F 700

Patent

active

052408078

ABSTRACT:
A water soluble built-on mask layer is provided on a photoresist composition disposed on a substrate. The photoresist comprises an o-quinone diazide and a novolak or paravinyl phenol resin. The built-on mask layer comprises a water soluble, photobleachable diazonium salt, a coupler for the diazonium salt and an acidic, polymeric, film forming resin such as polystyrene sulfonic acid.

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Anon, "1984-1985 Aldrich Catalog/Handbook of Fine Chemicals", 1984, Aldrich Chem. Co., Milwaukee, Wisconsin, p. 706.

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