Photoresist composition for use in color filters

Details Photoresist composition for use in color filters Photoresist composition for use in color filters

1996-08-29

1998-03-24

Higel, Floyd D.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Screen other than for cathode-ray tube

430145, 430165, 430191, 430293, 430294, 430321, 430323, 430329, 430330, 430394, G03F 900

Patent

active

057311102

ABSTRACT:
An azo dye for use in color filters soluble in alkaline aqueous solutions and organic solvents and having in one molecule at least one sulfonamido group of which one hydrogen atom is substituted; and a method for producing a color filter having a plurality of color filter elements which comprises the steps of a) coating a substrate with an organic solvent solution of a photoresist composition containing said azo dye and drying the coat to form an adhering layer, b) exposing a specific part of said layer to radiation ray, c) developing the exposed or unexposed region with alkali to form a colored pattern, and d) repeating the steps a)-c) on every dye of different color present in said composition.

REFERENCES:
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patent: 4524124 (1985-06-01), Bergthaller et al.
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patent: 5155005 (1992-10-01), Sato et al.
patent: 5268245 (1993-12-01), Chiulli
patent: 5362598 (1994-11-01), Takeyama et al.
Oppenkowski et al, Chemical Abstracts, 91:47300S (1979).
Takeyama et al, Chemical Abstracts, 114:33214Y (1991).

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