Electrical solid-state devices

Metal working – Method of mechanical manufacture – Assembling or joining

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Details

29580, 156 8, 156 17, 427 91, B01J 1700

Patent

active

039641562

ABSTRACT:
A method of manufacturing an electrical solid-state device in which the separation of adjacent areas of film material is controlled at a low value. The method employs established photoengraving techniques, and exploits the undermining of edges of photo-resist when the film material is etched away. The etching action is continued after exposure of the substrate, until the wall of film material recedes sufficiently to give a stable wall profile and a margin of exposed substrate which is overhung by photo-resist. Further film material is deposited on the substrate, but the margin, being sheltered by the overhanging photo-resist, remains uncovered.

REFERENCES:
patent: 3438121 (1969-04-01), Wanlass
patent: 3758943 (1973-09-01), Shibata

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