Photosensitive element with two layer passivation coating

Details Photosensitive element with two layer passivation coating Photosensitive element with two layer passivation coating

1992-06-01

1993-08-03

Nelms, David C.

Radiant energy

Photocells; circuits and apparatus

Photocell controlled circuit

257291, H01J 4014

Patent

active

052331814

ABSTRACT:
A photosensitive element has a two tier passivation layer disposed between the top contact layer and the amorphous silicon photosensor island. The passivation layer includes an inorganic moisture barrier layer which is disposed at least over the sidewalls of the photosensor island. The inorganic material forming this layer is preferably silicon nitride or silicon oxide. An organic dielectric layer is disposed over the moisture barrier layer and the photosensor island except for a selected contact area on the top surface of the photosensor island where the top contact layer is in electrical contact with the amorphous silicon material of the photosensor island. The organic dielectric material is preferably a polyimide.

REFERENCES:
patent: 4924282 (1990-05-01), Komiyama et al.
patent: 5101285 (1992-03-01), Kawai et al.
"Amorphous Silicon Image Sensor Array". M. J. Powell et al., Abstracts of Materials Research Society Meeting Apr. 27, 1992, Philips Research Laboratories, Redhill, Surrey, RH1 5HA, UK.

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