Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1978-02-27
1979-11-13
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
260141, 430302, 430318, 430270, G03C 154, C03C 170
Patent
active
041742222
ABSTRACT:
A gallic acid alkyl ester or a gallic acid aryl ester is reacted in an inert solvent with 3 equivalents of naphthoquinone-(1,2)-diazido-(2)-sulfonyl chloride in the presence of an alkali to effect sulfonylation of 3 hydroxyl groups in the gallic acid moiety whereby a photodecomposable naphthoquinone-(1,2)-diazido-(2)-sulfonic acid ester is obtained. The new naphthoquinonediazido derivative thus obtained is mixed with an alkali-soluble phenol resin such as m-cresol novolac resin or phenol novolac resin to prepare a positive-type photoresist composition having high sensitivity and high resolving power as well as excellent dimensional accuracy and etching-resistance. In addition, this composition forms a good photosensitive film and can be a good ink receptor.
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Chem. Abstracts, vol. 68, 1968, 55365g.
Chem. Abstracts, vol. 75, 1971, 43144r.
Asaumi Shingo
Komine Takashi
Nakane Hisashi
Okazaki Noboru
Yokota Akira
Bowers Jr. Charles L.
Tokyo Ohka Kogyo Kabushiki Kaisha
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