Positive type photosensitive resinous composition comprising a r

Details Positive type photosensitive resinous composition comprising a r Positive type photosensitive resinous composition comprising a r

1990-08-31

1993-08-03

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430191, 430193, 430326, 430906, 430910, 526277, G03F 7023, G03F 732, C08F 3002

Patent

active

052328163

ABSTRACT:
A positive type photosensitive resinous composition comprising a binder resin and a quinone diazide compound, the binder resin being a copolymer of

REFERENCES:
patent: 2993033 (1961-07-01), O'Brien
patent: 4123279 (1978-10-01), Kobayashi
patent: 4384037 (1983-05-01), Hosaka et al.
patent: 4511645 (1985-04-01), Koike et al.
patent: 4797345 (1989-01-01), Jeffries, III
patent: 4806450 (1989-02-01), Hofmann et al.
patent: 4925768 (1990-05-01), Iwasaki et al.
patent: 4946757 (1990-08-01), Seio et al.
Japanese Abstract 82-16373E/09 (Hitachi Chemical KK).
Japanese Abstract 82-010668 (Hitachi Chem. Co. Ltd).

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