Method and composition for depositing silicon dioxide layers

Details Method and composition for depositing silicon dioxide layers Method and composition for depositing silicon dioxide layers

1988-03-14

1988-10-25

Morris, Theodore

Coating processes

Coating by vapor, gas, or smoke

427 58, 427109, 4271262, 4271263, 427164, 427166, 427167, 4272551, 4272557, 427294, B32B 700, B32B 300

Patent

active

047803347

ABSTRACT:
A method and composition for depositing SiO.sub.2 on substrates by chemical vapor deposition are provided wherein aminoxysilane reagents are utilized. These aminoxysilane reagents pyrolyze at about the same temperatures as organometallic reagents, permitting multiple alternating layers of silicon dioxide and metal oxides to be formed at the same operating temperature.

REFERENCES:
patent: 2840489 (1958-06-01), Kempter et al.
patent: 4505985 (1985-03-01), Schmidt et al.
patent: 4663373 (1987-05-01), Ravichandran

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