Glass dimensional control using ion exchange

Details Glass dimensional control using ion exchange Glass dimensional control using ion exchange

1991-12-26

1993-08-03

Lindsay, Robert L.

Glass manufacturing

Processes

With chemically reactive treatment of glass preform

65 31, 65 33, C03C 1010

Patent

active

052324818

ABSTRACT:
This method is directed at a method for making selectively sculptured lithium silicate crystal-containing glass articles. A photonucleable, glass body is selectively exposed to short wave radiation and then heat treated to cause the development of crystals in those areas of the glass body which had been exposed to shortwave radiation. Those crystal-containing areas are then removed by acid etching and the resulting sculptured glass articles are thereafter exposed to short wave radiation and subsequently heat treated to obtain a degree of crystallization.
The inventive method further comprises an improvement step of fabricating glass articles that result in crystal-containing glass articles with smaller intermediate dimensions than the desired final dimensions and subjecting the crystal-containing glass articles to an ion exchange process which exchanges potassium ions for sodium and/or lithium ions at a temperature of about at least 500.degree. C. for a time sufficient to cause the crystal-containing glass article to grow to the desired final dimension.

REFERENCES:
patent: 2971853 (1961-02-01), Stookey
patent: 3997312 (1976-12-01), Besselink
patent: 4259406 (1981-03-01), Borrelli
patent: 5062877 (1991-11-01), Borrelli et al.

Affiliated with

Also associated with

Rating

Glass dimensional control using ion exchange does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Glass dimensional control using ion exchange, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Glass dimensional control using ion exchange will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2267073