Process for removing vanadium residues from polymer solutions

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Treating polymer containing material or treating a solid...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C08F 608

Patent

active

040163490

ABSTRACT:
Vanadium catalyst residues can be removed from solutions of organic solvents of homopolymers of .alpha.-olefins or their copolymers with hydrocarbon monomers by first contacting at a temperature of about room temperature to about 140.degree. C. the polymer solutions with polar liquid extractants supported on an inert, finely divided, solid material, such as diatomaceous silica, silica gel, alumina, or molecular sieves, then separating the solution from the solid material. Water is the preferred polar liquid, and diatomaceous silica is the preferred supporting material. Polymers recovered from solutions treated according to the process of this invention have a much lesser proportion of vanadium contaminants than those recovered from untreated solutions. This vanadium removal process is simple and inexpensive.

REFERENCES:
patent: 3164578 (1965-01-01), Baker et al.
patent: 3281399 (1966-10-01), Renaudo et al.
patent: 3374212 (1968-03-01), Marinak et al.
patent: 3547855 (1970-12-01), Loveless
patent: 3562227 (1971-02-01), Di Drusco et al.
patent: 3600463 (1971-08-01), Hagemeyer et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process for removing vanadium residues from polymer solutions does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for removing vanadium residues from polymer solutions, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for removing vanadium residues from polymer solutions will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2266905

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.