Method of measuring thickness of film with a reference sample ha

Details Method of measuring thickness of film with a reference sample ha Method of measuring thickness of film with a reference sample ha

1990-07-06

1992-03-31

Nelms, David C.

Radiant energy

Photocells; circuits and apparatus

Optical or pre-photocell system

356382, G01V 904

Patent

active

051011115

ABSTRACT:
Prior to measurement of the thickness dx of a thin film which is formed on a substrate, correlation data between the reflectance Rs of the film for light and the thickness dx thereof is stored in a data memory in the form of a table. A reference sample having a known reflectance Rp is prepared and the energy Ep of light reflected from the reference sample is measured. Also measured is the energy Es of light reflected from an objective sample having the thin film and the substrate. A value of the thickness dx is obtained through the table while setting Y=Rp therein, where y is calculated through a fomula y=(Rp/Ep).multidot.Es.

REFERENCES:
patent: 3017512 (1962-01-01), Wolbert
patent: 4676647 (1987-06-01), Kikkawa et al.
patent: 4899055 (1990-02-01), Adams

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