Method for fabricating an electrostatic discharge protection cir

Details Method for fabricating an electrostatic discharge protection cir Method for fabricating an electrostatic discharge protection cir

1996-03-08

1997-09-30

Wilczewski, Mary

Fishing, trapping, and vermin destroying

437 44, 437 56, 437 58, 257356, H01L 21336

Patent

active

056725272

ABSTRACT:
A process for fabricating ESD protection circuit has been developed, in which decreased cycle time has been achieved via a reduction in photomasking steps. The present invention process features the use of only one photo mask to form ESD protection circuit without the saliside and the LDD structure. The method of present invention needs only one mask instead of several masks as in a conventional process to create the ESD protection circuit during the salicide process of the MOSFET.

REFERENCES:
patent: 4717684 (1988-01-01), Katto et al.
patent: 5246872 (1993-09-01), Mortensen
patent: 5262344 (1993-11-01), Mistry
patent: 5455444 (1995-10-01), Hsue
patent: 5516717 (1996-05-01), Hsu
patent: 5517049 (1996-05-01), Huang
patent: 5529941 (1996-06-01), Huang
patent: 5532178 (1996-07-01), Liaw et al.

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