Superconductor technology: apparatus – material – process – High temperature – per se – Having tc greater than or equal to 150 k
Patent
1991-07-15
1993-11-16
Padgett, Marianne
Superconductor technology: apparatus, material, process
High temperature , per se
Having tc greater than or equal to 150 k
427504, 427510, 427525, 427526, 427533, 427552, 427 63, 505734, 505742, 156628, 156633, 156634, B05D 306, B05D 512, B44C 122, H01L 21306
Patent
active
052623920
ABSTRACT:
A method for patterning precursor film, a product thereof, a method for preparing a patterned ceramic film and a processing workpiece. The method for patterning precursor film includes the steps of depositing a blocking layer over the precursor film, patterning the overlaid blocking layer to uncover portions of the precursor film, irradiating the patterned blocking layer and uncovered portions of the precursor film with a beam sufficiently energetic to radiation modify the full thickness of unmasked portions of the precursor film and insufficiently energetic to radiation modify portions of the precursor film covered by the blocking layer, and developing the precursor film. The blocking layer has a lesser thickness than the precursor film, but is sufficiently thick to block an irradiating beam having the minimal energy necessary to radiation modify the full thickness of the precursor layer.
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Hung Liang-Sun
Hung Yann
Zheng Long-ru
Eastman Kodak Company
Padgett Marianne
Walker Robert Luke
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