Alignment system for a Half-Field Dyson projection system

Photocopying – Projection printing and copying cameras – Step and repeat

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355 43, G03B 2742

Patent

active

054022053

ABSTRACT:
An alignment system for a unit magnification system (such as a Half-Field Dyson system) for use in microlithography is provided. The alignment system provides for aligning a pattern on a reticle with a complementary pattern on a wafer.

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