Plasma discharge apparatus

Details Plasma discharge apparatus Plasma discharge apparatus

1995-08-23

1997-09-30

Niebling, John

Coating apparatus

Gas or vapor deposition

With treating means

31323131, C23C 1600

Patent

active

056722087

ABSTRACT:
A plasma discharge apparatus formed with a plasma chamber in which discharge is carried out wherein use is made, as the discharge gas sealed in the plasma chamber, of a mixed gas represented by Ne.sub.100-x Ar.sub.x A.sub.y (wherein, A is Ar, Kr, and/or Xe, x is 10 to 30 percent by volume, and y is 1 to 10 percent by volume). Note that when Kr and Xe are included as A, it is preferable that the Kr be included in an amount of 1 to 5 percent by volume and the Xe in an amount of 1 to 5 percent by volume.

REFERENCES:
patent: 4368465 (1983-01-01), Hirakawa et al.
patent: 4613855 (1986-09-01), Person et al.
patent: 4841556 (1989-06-01), Kato et al.
patent: 5086257 (1992-02-01), Gay et al.
Patent Abstracts of Japan, E-1492, p. 158 JP,A 05-266804 (Noritake Co. Ltd), Oct. 15, 1993.
KR 8702196 B (Gold Star Co.), Dec. 28, 1987.
Derwent Abstract Accession No. 95 010224/04 Class VO5, JP,A, 06-295674 (Fujitsu General ltd.), Oct. 21, 1994.

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