Semiconductor device structure for insulated gate bipolar transi

Active solid-state devices (e.g. – transistors – solid-state diode – Regenerative type switching device – Combined with field effect transistor

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257140, 257146, H01L 2974, H01L 31111

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active

058941398

ABSTRACT:
A semiconductor device is provided which includes a first-conductivity-type collector layer having a rear surface on which a collector electrode is formed, a second-conductivity-type buffer layer laminated on the collector layer, a second-conductivity-type conductivity modulation layer formed on the buffer layer, a first-conductivity-type emitter layer formed as a well in a surface of the conductivity modulation layer, a second-conductivity-type source region formed in a surface of a well edge portion of the emitter layer, a gate electrode formed through a gate insulating film to overlap the source region and the conductivity modulation layer, and an emitter electrode that is in ohmic contact with both the emitter layer and the source region. In the present device, the second-conductivity-type source region includes a second-conductivity-type source region formed in the well edge of the emitter layer, and a second-conductivity-type source contact region formed adjacent to the source region and held in ohmic contact with the emitter electrode. This source contact region has a higher impurity concentration than the source region.

REFERENCES:
patent: 5057884 (1991-10-01), Suzuki et al.
patent: 5124772 (1992-06-01), Hideshima et al.
patent: 5247207 (1993-09-01), Wert et al.
patent: 5296725 (1994-03-01), Nandakuman et al.
patent: 5475252 (1995-12-01), Merrill et al.

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