Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – From reactant having at least one -n=c=x group as well as...
Patent
1986-12-29
1988-04-05
Anderson, Harold D.
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
From reactant having at least one -n=c=x group as well as...
528 67, 528 85, C08G 1870, C08G 1832, C08G 1860
Patent
active
047360097
ABSTRACT:
Partially alkylated polyamines which may be viewed as low molecular weight polymers of x-amino-y-methylenephenyl are effective curing agents in combination with other polyamines and polyols in reaction injection molding for diverse class of polyisocyanates. Alkylation may range from 5 up to 100 percent to afford polyamines with a board spectrum of cure times, as well as to give elastomers with an interesting and useful diversity of properties. Such polyamines may be used as a constituent in a blend of polyamines as the isocyanate-reactive component, in which case the elastomer may be viewed as predominantly a polyurea, or as a constituent in a blend with polyols, in which case the elastomer may be viewed as an elastomer with both urethane and urea segments.
REFERENCES:
patent: 3681291 (1972-08-01), Khan
patent: 4048105 (1977-09-01), Salisbury
patent: 4324867 (1982-04-01), Patton, Jr. et al.
patent: 4459399 (1974-07-01), Ihrmen et al.
patent: 4495081 (1985-01-01), Vanderhider et al.
Baumann William M.
House David W.
Scott, Jr. Ray V.
Anderson Harold D.
Daley Dennis R.
McBride Thomas K.
Snyder Eugene I.
Spears Jr. John F.
LandOfFree
Partially alkylated triamines and higher polyamines as curing ag does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Partially alkylated triamines and higher polyamines as curing ag, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Partially alkylated triamines and higher polyamines as curing ag will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2234324