Removal of residual catalyst from a dielectric substrate

Details Removal of residual catalyst from a dielectric substrate Removal of residual catalyst from a dielectric substrate

1987-05-18

1988-04-05

Newsome, John H.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 98, G03C 500

Patent

active

047358203

ABSTRACT:
Residual catalyst is removed from a dielectric substrate by exposing the substrate to a plasma formed from an inert gas.

REFERENCES:
patent: 4214966 (1980-07-01), Mahoney
patent: 4357369 (1982-11-01), Kilichowski et al.
patent: 4545851 (1985-10-01), Takada
patent: 4568562 (1986-02-01), Phillips
patent: 4585668 (1986-04-01), Asmussen et al.
patent: 4610910 (1986-09-01), Kawamoto et al.

Affiliated with

Also associated with

Rating

Removal of residual catalyst from a dielectric substrate does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Removal of residual catalyst from a dielectric substrate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Removal of residual catalyst from a dielectric substrate will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2232866