Method and apparatus for precisely detecting surface position of

Details Method and apparatus for precisely detecting surface position of Method and apparatus for precisely detecting surface position of

1991-07-08

1992-06-02

Nelms, David C.

Radiant energy

Photocells; circuits and apparatus

Optical or pre-photocell system

356394, G01N 2186

Patent

active

051189577

ABSTRACT:
A surface position detecting method, including the steps of: detecting a surface shape of a first wafer having a pattern formed thereon or a surface shape of a second wafer having a pattern which is substantially of the same structure as that of the pattern of the first wafer; detecting, on the basis of detection of the surface shape, an error which might be caused at the time of detection of a surface position of the first wafer in dependence upon the structure of the pattern thereof; and detecting the surface position of the first wafer while correcting the detected error.

REFERENCES:
patent: 4362389 (1982-12-01), Koizumi et al.
patent: 4395117 (1983-07-01), Suzuki
patent: 4600282 (1986-07-01), Yamamura et al.
patent: 4714331 (1987-12-01), Oda et al.
patent: 4823014 (1989-04-01), Miyawaki
patent: 4874954 (1989-10-01), Takahashi et al.
patent: 4952970 (1990-08-01), Suzuki et al.

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