Poly(1,3,4-oxadiozoles) via aromatic nucleophilic displacement

Details Poly(1,3,4-oxadiozoles) via aromatic nucleophilic displacement Poly(1,3,4-oxadiozoles) via aromatic nucleophilic displacement

1991-01-22

1992-06-02

Kight, III, John

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

From phenol, phenol ether, or inorganic phenolate

548143, C08G 7308, C07D27110

Patent

active

051187817

ABSTRACT:
Poly(1,3,4-oxadiazoles) (POX) are prepared by the aromatic nucleophilic displacement reaction of di(hydroxyphenyl)-1,3,4-oxadiazole monomers with activated aromatic dihalides or activated aromatic dinitro compounds. The polymerizations are carried out in polar aprotic solvents such as sulfolane or diphenylsulfone using alkali metal bases such as potassium carbonate at elevated temperatures under nitrogen. The di(hydroxyphenyl)-1,3,4-oxadiazole monomers are synthesized by reacting 4-hydroxybenzoic hydrazide with phenyl-4-hydrobenzoate in the melt and also by reacting aromatic dihydrazides with two moles of phenyl-4-hydroxybenzoate in the melt. This synthetic route has provided high molecular weight POX of new chemical structure, is economically and synthetically more favorable than other routes, and allows for facile chemical structure variation due to the large variety of activated aromatic dihalides which are available.

REFERENCES:
patent: 4104468 (1978-08-01), Valenti
patent: 4141729 (1979-02-01), Okazaki et al.
patent: 4701399 (1987-10-01), Nagano et al.
patent: 5066811 (1991-11-01), Connell et al.

Affiliated with

Also associated with

Rating

Poly(1,3,4-oxadiozoles) via aromatic nucleophilic displacement does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Poly(1,3,4-oxadiozoles) via aromatic nucleophilic displacement, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Poly(1,3,4-oxadiozoles) via aromatic nucleophilic displacement will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2229486