Electron beam lithographic system

Details Electron beam lithographic system Electron beam lithographic system

1976-12-21

1979-03-20

Truhe, J. V.

Electric heating

Metal heating

By arc

250396R, B23K 1500

Patent

active

041455975

ABSTRACT:
An electron beam lithographic system which exposes a desired area of an electron beam resist so as to form a desired pattern to be used for manufacturing large scale integrated circuits. This electron beam lithographic system provides a first and a second slit plate, respectively providing a rectangular slit so as to form an electron beam having a rectangular cross section, and a deflection means which deflects the electron beam passing the first slit so as to vary the cross section of the electron beam which passes the second slit. Therefore, electron beams having various cross sections can be obtained, so that the electron beam resist is exposed by the beam having various cross sections and the desired pattern can be formed within a short time on a wafer.

REFERENCES:
patent: 3513285 (1970-05-01), Shingo Imura
patent: 3638231 (1972-01-01), Le Poole et al.
patent: 3644700 (1972-02-01), Kruppa et al.
patent: 3648048 (1972-03-01), Cahan et al.
patent: 3875415 (1975-04-01), Woodard
patent: 3875416 (1975-04-01), Spicer
patent: 3900737 (1975-08-01), Collier et al.
patent: 3956635 (1976-05-01), Chang
H. C. Pfeiffer, "New Imaging & Deflection Concept for Probe-Forming Microfabrication Systems", Journal of Vacuum Science Technology, vol. 12, No. 8, 11/12/1975.

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